Hackspace Move/Electronics: Difference between revisions
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* Power (alisonw) | * Power (alisonw) | ||
* Comms (Jasper/tgreer) - Running water supply for etching | * Comms (Jasper/tgreer) - Running water supply for etching | ||
== Logistics == | |||
Refer to logistics page [[Hackspace_Move/Logistics|page]] | |||
== Electronics stations == | == Electronics stations == | ||
Revision as of 16:39, 9 April 2013
Responsible: mentar
Dependencies
- Ventilation (Paddy, Steve, Charles)
- Mild HCL fumes likely during etching, filter must be able to deal with these
- Drainage (none!) - Normal requirements for etching, HCL not strong enough to warrant special treatment
- Power (alisonw)
- Comms (Jasper/tgreer) - Running water supply for etching
Logistics
Refer to logistics page page
Electronics stations
The plan is to have 2 soldering and 1 test bench upstairs
Etching station
The etch tank needs ventilation, running water and drainage, hence the plan is to locate it downstairs between the biolab and the lift shaft.
